The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 13, 2026
Filed:
Sep. 20, 2018
Applied Materials, Inc., Santa Clara, CA (US);
Sivakumar Dhandapani, San Jose, CA (US);
Jun Qian, Sunnyvale, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method for processing substrates includes subjecting each respective first substrate of a first plurality of substrates to a process that modifies a thickness of an outer layer of the respective first substrate, generating a plurality of groups of process parameter values; generating a plurality of removal profiles, training an artificial neural network by backpropagation using the plurality of groups of process parameter and plurality of removal profiles as training data where the artificial neural network has a plurality of input nodes to receive respective removal values from the removal profile and a plurality of output nodes to output control parameter values, for each respective second substrate of a second plurality of substrates determining a target removal profile, determining respective control parameter values to apply by applying the target removal profile to the input nodes, and subjecting each respective second substrate to the process using the respective control parameter values.