Company Filing History:

6 out of 13,684

Applied Materials, Inc.

patents

5 out of 3,768

Lam Research Corporation

patents

Years Active: 2004-2017

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11 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 9546432 - Dense oxide coated component of a plasma processing chamber and method of manufacture thereof (2017-01-17),

2. 9387521 - Method of wet cleaning aluminum chamber parts (2016-07-12),

3. 9337002 - Corrosion resistant aluminum coating on plasma chamber components (2016-05-10),

4. 9123651 - Dense oxide coated component of a plasma processing chamber and method of manufacture thereof (2015-09-01),

5. 8545639 - Method of cleaning aluminum plasma chamber parts (2013-10-01),

6. 6905622 - Electroless deposition method (2005-06-14),

7. 6899816 - Electroless deposition method (2005-05-31),

8. 6878245 - Method and apparatus for reducing organic depletion during non-processing time periods (2005-04-12),

9. 6824666 - Electroless deposition method over sub-micron apertures (2004-11-30),

10. 6821909 - Post rinse to improve selective deposition of electroless cobalt on copper for ULSI application (2004-11-23),

11. 6797620 - Method and apparatus for improved electroplating fill of an aperture (2004-09-28),

Title: The Innovative Contributions of Sivakami Ramanathan

Introduction

Sivakami Ramanathan is a prominent inventor based in Fremont, CA. She has made significant contributions to the field of semiconductor processing equipment, holding a total of 11 patents. Her work focuses on enhancing the efficiency and effectiveness of manufacturing processes in this critical industry.

Latest Patents

Among her latest patents is a method for creating a dense oxide coating on aluminum components used in plasma processing chambers. This innovative technique involves cold spraying a layer of pure aluminum onto the component's surface, followed by a plasma electrolytic oxidation process. This process results in microplasmic discharges that form a dense oxide coating, improving the durability and performance of the equipment. Another notable patent is a method for wet cleaning aluminum chamber parts. This method includes dry ice blasting and soaking the aluminum parts in deionized water, ensuring thorough cleaning of both bare and anodized aluminum surfaces.

Career Highlights

Sivakami has worked with leading companies in the semiconductor industry, including Applied Materials, Inc. and Lam Research Corporation. Her experience in these organizations has allowed her to develop and refine her innovative techniques, contributing to advancements in semiconductor manufacturing.

Collaborations

Throughout her career, Sivakami has collaborated with talented professionals, including Srinivas Gandikota and Girish Anant Dixit. These collaborations have fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

Sivakami Ramanathan's contributions to the field of semiconductor processing are noteworthy. Her innovative patents and collaborative efforts have significantly impacted the industry, showcasing her expertise and dedication to advancing technology.

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