The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 17, 2017
Filed:
Aug. 04, 2015
Lam Research Corporation, Fremont, CA (US);
Hong Shih, Walnut, CA (US);
Lin Xu, Katy, TX (US);
John Michael Kerns, Livermore, CA (US);
William Charles, Los Altos, CA (US);
John Daugherty, Fremont, CA (US);
Sivakami Ramanathan, Fremont, CA (US);
Russell Ormond, San Jose, CA (US);
Robert G. O'Neill, Fremont, CA (US);
Tom Stevenson, Morgan Hill, CA (US);
LAM RESEARCH CORPORATION, Fremont, CA (US);
Abstract
A method of forming a dense oxide coating on an aluminum component of semiconductor processing equipment comprises cold spraying a layer of pure aluminum on a surface of the aluminum component to a predetermined thickness. A dense oxide coating is then formed on the layer of pure aluminum using a plasma electrolytic oxidation process, wherein the plasma electrolytic oxidation process causes the layer of pure aluminum to undergo microplasmic discharges, thus forming the dense oxide coating on the layer of pure aluminum on the surface of the aluminum component.