Culver City, CA, United States of America

Siu Fai Cheng

USPTO Granted Patents = 12 

Average Co-Inventor Count = 4.5

ph-index = 5

Forward Citations = 82(Granted Patents)


Location History:

  • San Jose, CA (US) (2012)
  • Los Angeles, CA (US) (2012 - 2019)
  • Culver City, CA (US) (2016 - 2022)

Company Filing History:


Years Active: 2012-2022

where 'Filed Patents' based on already Granted Patents

12 patents (USPTO):

Title: The Innovative Contributions of Siu Fai Cheng

Introduction

Siu Fai Cheng is a prominent inventor based in Culver City, California, known for his significant contributions to the field of plasma technology and semiconductor manufacturing. With a total of 12 patents to his name, Cheng has made remarkable advancements that enhance the efficiency and effectiveness of various industrial processes.

Latest Patents

Cheng's latest patents include groundbreaking technologies such as the "Low temperature atmospheric pressure plasma for cleaning and activating metals." This invention utilizes argon or helium at atmospheric pressure and low temperatures, generating high concentrations of reactive species in the effluent stream. The developed laminar gas flow prior to plasma formation allows for stable operation, even under conditions that would typically extinguish the plasma. This technology is particularly useful for cleaning and activating metal substrates, effectively removing oxidation and improving the bonding of additional materials.

Another notable patent is the "Shadow ring for modifying wafer edge and bevel deposition." This invention introduces a shadow ring that optimizes deposition on the edges of wafers. By adjusting the material and dimensions of the shadow ring, Cheng's design allows for increased edge deposition and uniform coverage, which is crucial in semiconductor manufacturing.

Career Highlights

Throughout his career, Siu Fai Cheng has worked with leading companies in the technology sector, including Applied Materials, Inc. and Surfx Technologies LLC. His experience in these organizations has contributed to his expertise in plasma applications and semiconductor processes.

Collaborations

Cheng has collaborated with notable professionals in his field, including Deenesh Padhi and Robert F. Hicks. These partnerships have fostered innovation and have led to the development of advanced technologies that benefit the industry.

Conclusion

Siu Fai Cheng's contributions to plasma technology and semiconductor manufacturing are significant and impactful. His innovative patents and collaborations reflect his dedication to advancing technology and improving industrial processes. Cheng's work continues to influence the field, paving the way for future innovations.

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