The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 17, 2012
Filed:
Apr. 28, 2008
Jianhua Zhou, San Jose, CA (US);
Deenesh Padhi, Sunnyvale, CA (US);
Karthik Janakiraman, San Jose, CA (US);
Hang Yu, Santa Clara, CA (US);
Siu F. Cheng, San Jose, CA (US);
Yoganand Saripalli, Santa Clara, CA (US);
Tersem Summan, San Jose, CA (US);
Jianhua Zhou, San Jose, CA (US);
Deenesh Padhi, Sunnyvale, CA (US);
Karthik Janakiraman, San Jose, CA (US);
Hang Yu, Santa Clara, CA (US);
Siu F. Cheng, San Jose, CA (US);
Yoganand Saripalli, Santa Clara, CA (US);
Tersem Summan, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method and apparatus for adjust local plasma density during a plasma process. One embodiment provides an electrode assembly comprising a conductive faceplate having a nonplanar surface. The nonplanar surface is configured to face a substrate during processing and the conductive faceplate is disposed so that the nonplanar surface is opposing a substrate support having an electrode. The conductive faceplate and the substrate support form a plasma volume. The nonplanar surface is configured to adjust electric field between the conductive plate and the electrode by varying a distance between the conductive plate and the electrode.