Santa Clara, CA, United States of America

Yoganand Saripalli


Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2012

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1 patent (USPTO):

Title: **Innovator Spotlight: Yoganand Saripalli**

Introduction

Yoganand Saripalli, based in Santa Clara, California, is a notable inventor recognized for his innovative contributions in the field of plasma processing technology. As a member of Applied Materials, Inc., Saripalli's work focuses on advancing manufacturing processes used in the semiconductor industry.

Latest Patents

Saripalli holds a patent for a "Nonplanar Faceplate for a Plasma Processing Chamber." This invention describes a method and apparatus designed to adjust local plasma density during plasma processing. The patent specifically details an electrode assembly featuring a conductive faceplate with a nonplanar surface. This unique configuration allows for the modification of the electric field between the conductive plate and the electrode by adjusting the distance between them, thereby forming an optimized plasma volume essential for processing substrates.

Career Highlights

Throughout his career at Applied Materials, Inc., Yoganand Saripalli has demonstrated a strong commitment to innovation and excellence in his field. His invention not only enhances plasma processing efficiency but also paves the way for further developments in semiconductor manufacturing technologies.

Collaborations

Saripalli collaborates closely with colleagues Jianhua Zhou and Deenesh Padhi, contributing to a dynamic team environment that fuels innovation at Applied Materials. Together, they leverage their collective expertise to push the boundaries of technology in semiconductor processing.

Conclusion

Yoganand Saripalli’s innovative spirit and dedication to research have significantly impacted the plasma processing domain. With his patented technology, he continues to play a pivotal role in advancing manufacturing processes, reinforcing the importance of innovation in today's fast-paced technological landscape.

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