The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 06, 2022
Filed:
Sep. 10, 2020
Surfx Technologies Llc, Redondo Beach, CA (US);
Siu Fai Cheng, Culver City, CA (US);
Thomas Scott Williams, Los Angeles, CA (US);
Toby Desmond Oste, Sydney, AU;
Sarkis Minas Keshishian, Sydney, AU;
Robert F. Hicks, Los Angeles, CA (US);
Surfx Technologies LLC, Redondo Beach, CA (US);
Abstract
Plasma applications are disclosed that operate with argon or helium at atmospheric pressure, and at low temperatures, and with high concentrations of reactive species in the effluent stream. Laminar gas flow is developed prior to forming the plasma and at least one of the electrodes can be heated which enables operation at conditions where the argon or helium plasma would otherwise be unstable and either extinguish, or transition into an arc. The techniques can be employed to clean and activate a metal substrate, including removal of oxidation, thereby enhancing the bonding of at least one other material to the metal.