Sarkis Minas Keshishian

Title: Innovations of Sarkis Minas Keshishian

Introduction

Sarkis Minas Keshishian is a notable inventor based in Sydney, Australia. He has made significant contributions to the field of plasma technology, particularly in the cleaning and activation of metals. With a total of four patents to his name, Keshishian's work has implications for various industrial applications.

Latest Patents

Keshishian's latest patents focus on low temperature atmospheric pressure plasma for cleaning and activating metals. These plasma applications operate with argon or helium at atmospheric pressure and low temperatures, featuring high concentrations of reactive species in the effluent stream. A laminar gas flow is developed prior to forming the plasma, and at least one of the electrodes can be heated. This innovation enables operation under conditions where the argon or helium plasma would otherwise be unstable, preventing it from extinguishing or transitioning into an arc. The techniques can effectively clean and activate a metal substrate, including the removal of oxidation, thereby enhancing the bonding of other materials to the metal.

Career Highlights

Keshishian is currently associated with Surfx Technologies LLC, where he continues to advance his research and development efforts. His work has garnered attention for its potential to improve industrial processes and enhance material properties.

Collaborations

Some of Keshishian's notable coworkers include Siu Fai Cheng and Thomas Scott Williams. Their collaborative efforts contribute to the innovative environment at Surfx Technologies LLC.

Conclusion

Sarkis Minas Keshishian is a prominent figure in the field of plasma technology, with a focus on enhancing metal cleaning and activation processes. His contributions through patents and collaborations reflect his commitment to innovation and advancement in this area.