Portland, OR, United States of America

Sin Sim Tan

USPTO Granted Patents = 21 

 

Average Co-Inventor Count = 4.6

ph-index = 8

Forward Citations = 128(Granted Patents)


Location History:

  • Hillsboro, OR (US) (1999 - 2001)
  • Portland, OR (US) (2003 - 2024)

Company Filing History:


Years Active: 1999-2024

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21 patents (USPTO):Explore Patents

Title: Sin Sim Tan: Pioneering Innovation in Portland

Introduction: Sin Sim Tan, a dedicated inventor based in Portland, Oregon, has emerged as a true pioneer in the world of innovation. With an impressive portfolio of 20 patents, his groundbreaking work continues to inspire and shape the future of inventors and innovators worldwide.

Latest Patents: Sin Sim Tan's recent patents showcase his ingenuity and technical expertise. One notable invention includes the 'Presentation of Direct Accessed Storage under a Logical Drive Model,' which revolutionizes data storage architecture. Another significant patent is the 'Enhanced Cyclical Redundancy Check Circuit based on Galois-Field Arithmetic,' highlighting his mastery in error detection technologies.

Career Highlights: With a successful tenure at Intel Corporation and other renowned companies, Sin Sim Tan has proven his mettle in the tech industry. His innovative solutions have significantly contributed to advancements in data protection, SSD latency optimization, and controller performance enhancement.

Collaborations: Throughout his career, Sin Sim Tan has collaborated with esteemed professionals such as Sivakumar Radhakrishnan and Lily Pao Looi. These partnerships have fostered a creative environment where groundbreaking ideas flourish, leading to the development of cutting-edge technologies.

Conclusion: Sin Sim Tan's relentless dedication to pushing the boundaries of innovation has established him as a trailblazer in the field of technology. His transformative inventions not only enhance current systems but also pave the way for future technological advancements. Sin Sim Tan's impact on the world of innovation is profound and enduring, setting a high standard for aspiring inventors to follow.

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