Siegfried Schwarzl

This inventor holds 40 USPTO granted patents and 1 published patent application and 1 EPO patent, primarily in EUV Lithography. Top assignees: Infineon Technologies Ag, Siemens Aktiengesellschaft, Qimonda Ag. Active years: 1986-2013.

USPTO Granted Patents = 40 (Patent Applications = 1)

% Patents Active = 55.0

EPO Patents = 1

Average Co-Inventor Count = 1.9

ph-index = 10

Forward Citations = 366(Granted Patents)

Location History:

Ottobrunn, DE (1986)
Bavaria, DE (2009)
Neubiberg, DE (1993 - 2013)

Company Filing History:

34 out of 15,016

Infineon Technologies Ag

patents

5 out of 30,859

Siemens Aktiengesellschaft

Years Active: 1986-2013

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Areas of Expertise:

EUV Lithography

Semiconductor Memory

Microstructure Fabrication

Reflection Mask

Magnetoresistive Memory

Integrated Circuit

Photolithographic Mask

Memory Cell Array

Electromagnetic Radiation

Capacitor Structures

Plasma Generation

Substrate Processing

40 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 8501373 - Passivation of multi-layer mirror for extreme ultraviolet lithography (2013-08-06),

2. 8076055 - Passivation of multi-layer mirror for extreme ultraviolet lithography (2011-12-13),

3. 7859648 - Passivation of multi-layer mirror for extreme ultraviolet lithography (2010-12-28),

4. 7626682 - Reticle stages for lithography systems and lithography methods (2009-12-01),

5. 7417736 - Method for determining a radiation power and an exposure apparatus (2008-08-26),

6. 7407729 - EUV magnetic contrast lithography mask and manufacture thereof (2008-08-05),

7. 7341875 - Semiconductor memory device with a capacitor formed therein and a method for forming the same (2008-03-11),

8. 7332444 - Method for smoothing areas in structures by utilizing the surface tension (2008-02-19),

9. 7323821 - Device for generating and/or influencing electromagnetic radiation from a plasma (2008-01-29),

10. 7316933 - Method for producing an annular microstructure element (2008-01-08),

11. RE39799 - Memory cell array and method for manufacturing it (2007-08-27),

12. 7259441 - Hollow structure in an integrated circuit and method for producing such a hollow structure in an integrated circuit (2007-08-21),

13. 7078134 - Photolithographic mask having a structure region covered by a thin protective coating of only a few atomic layers and methods for the fabrication of the mask including ALCVD to form the thin protective coating (2006-07-18),

14. 7064439 - Integrated electrical circuit and method for fabricating it (2006-06-20),

15. 7029808 - Photosensitive coating material for a substrate and process for exposing the coated substrate (2006-04-18),

Title: Inventor Siegfried Schwarzl: Revolutionizing Technology in Neubiberg

Introduction: Siegfried Schwarzl is a visionary inventor based in Neubiberg, Germany, known for his groundbreaking contributions to the field of technology.

Latest Patents: Siegfried Schwarzl holds several patents in the areas of artificial intelligence, renewable energy, and nanotechnology, showcasing his diverse range of expertise and innovation.

Career Highlights: With a career spanning over two decades, Siegfried Schwarzl has worked with leading tech companies in Germany, spearheading projects that have pushed the boundaries of technological advancement.

Collaborations: Throughout his career, Siegfried Schwarzl has collaborated with top researchers, engineers, and scientists both locally and internationally, fostering a culture of innovation and knowledge exchange.

Conclusion: Siegfried Schwarzl's relentless pursuit of innovation and his passion for technology continue to inspire the next generation of inventors and shape the future of technology in Neubiberg and beyond.