The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 29, 2008
Filed:
Nov. 30, 2005
Applicants:
Siegfried Schwarzl, Neubiberg, DE;
Stefan Wurm, Austin, TX (US);
Inventors:
Siegfried Schwarzl, Neubiberg, DE;
Stefan Wurm, Austin, TX (US);
Assignee:
Qimonda AG, Munich, DE;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 7/24 (2006.01);
U.S. Cl.
CPC ...
Abstract
A device generates and/or influences electromagnetic radiation from a plasma, for the lithographic production of semiconductor elements. For example, the device generates and/or reflects EUV-radiation for EUV-lithography. In a first example, a magnetic means () generates at least one inhomogeneous magnetic field () and is provided as means for the targeted screening of at least one surface of the device () and/or another component () from the charge carriers in the plasma ().