San Jose, CA, United States of America

Shuogang Huang

This inventor holds 6 USPTO granted patents and 9 published patent applications. Top assignees: Intermolecular, Inc., Lam Research Corporation. Active years: 2014-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shuogang Huang. Retrieved from https://idiyas.com/inventor/shuogang-huang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 6 

% Patents Active = 50.0

Average Co-Inventor Count = 2.3

ph-index = 2

Forward Citations = 20(Granted Patents)


Company Filing History:


Years Active: 2014-2025

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6 patents (USPTO):Explore Patents

Title: Innovations of Shuogang Huang

Introduction

Shuogang Huang is a prominent inventor based in San Jose, CA, known for his contributions to the field of semiconductor processing. With a total of 6 patents, he has made significant advancements in methods and apparatuses for etching and treatment of substrates.

Latest Patents

One of his latest patents is titled "Method and apparatus for anisotropic pattern etching and treatment." This patent discusses methods and apparatuses for providing an anisotropic ion beam for etching and treatment of substrates. In one embodiment, a system for processing a substrate includes a chamber, a chuck assembly, an ion source, and a grid system. The ion source includes grid system interfaces that connect both the chamber and the ion source, featuring a plurality of holes through which ions are extracted to form an ion beam. The grid system is oriented so that the ion beam is directed into the chamber toward the substrate support, with the array of holes defined vertically by a y-axis and horizontally by an x-axis. The hole densities vary vertically in the y-axis, causing the ion beam to have an energy density gradient defined vertically in the y-axis. Another notable patent is for a "Chamber for patterning non-volatile metals." This patent describes apparatuses suitable for etching substrates at various pressure regimes, including a process chamber with a movable pedestal capable of being positioned at either a raised or lowered position, a showerhead, and an optional plasma generator.

Career Highlights

Shuogang Huang has worked with several notable companies throughout his career, including Lam Research Corporation and Intermolecular, Inc. His experience in these organizations has contributed to his expertise in semiconductor technologies and innovations.

Collaborations

He has collaborated with several professionals in the field, including Meihua Shen and Thorsten B Lill, which has further enriched his work and contributions to the industry.

Conclusion

Shuogang Huang's innovative work in semiconductor processing and etching technologies has established him as a significant figure in the field. His patents reflect his commitment to advancing technology and improving processes in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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