The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 24, 2018
Filed:
Feb. 05, 2016
Applicant:
Lam Research Corporation, Fremont, CA (US);
Inventors:
Meihua Shen, Fremont, CA (US);
Shuogang Huang, San Jose, CA (US);
Thorsten Lill, Santa Clara, CA (US);
Theo Panagopoulos, San Jose, CA (US);
Assignee:
Lam Research Corporation, Fremont, CA (US);
Primary Examiner:
Int. Cl.
CPC ...
C23F 1/00 (2006.01); H01L 21/3213 (2006.01); H01J 37/32 (2006.01); C23C 14/50 (2006.01); H01L 21/67 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
H01L 21/32136 (2013.01); C23C 14/50 (2013.01); H01J 37/32715 (2013.01); H01L 21/32135 (2013.01); H01L 21/32138 (2013.01); H01L 21/67069 (2013.01); H01L 21/68735 (2013.01); H01L 21/68764 (2013.01);
Abstract
Apparatuses suitable for etching substrates at various pressure regimes are described herein. Apparatuses include a process chamber including a movable pedestal capable of being positioned at a raised position or a lowered position, showerhead, and optional plasma generator. Apparatuses may be suitable for etching non-volatile metals using a treatment while the movable pedestal is in the lowered position and a high pressure exposure to organic vapor while the movable pedestal is in the raised position.