Tokyo, Japan

Shunsuke Nakai

This inventor holds 20 USPTO granted patents and 1 published patent application, primarily in Substrate Polishing Technology. Top assignees: Ebara Corporation, Shimadzu Corporation, Kabushiki Kaisha Toshiba. Active years: 2003-2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shunsuke Nakai. Retrieved from https://idiyas.com/inventor/shunsuke-nakai

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 20 

% Patents Active = 90.0

Average Co-Inventor Count = 3.8

ph-index = 8

Forward Citations = 161(Granted Patents)


Location History:

  • Kanagawa-ken, JP (2003 - 2010)
  • Tokyo, JP (2004 - 2019)

Company Filing History:


Years Active: 2003-2019

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Areas of Expertise:
Polishing Method
End Point Detection
Polishing Apparatus
Film Thickness Measurement
Substrate Processing
Monitoring Method
Thickness Measurement Apparatus
Substrate Film Thickness
Polishing State Monitoring
Substrate Polishing
Measurement Apparatus
Processing Apparatus
20 patents (USPTO):Explore Patents

Title: Innovations by Shunsuke Nakai: Advancements in Processing Technology

Introduction

Shunsuke Nakai is a distinguished inventor based in Tokyo, Japan. With a remarkable portfolio of 20 patents, Nakai has significantly contributed to advancements in processing technology. His pioneering work focuses on methods that enhance the efficiency and precision of polishing processes, crucial in various manufacturing sectors.

Latest Patents

Nakai's latest innovations include a processing end point detection method, a polishing method, and a polishing apparatus. The processing end point detection method is particularly noteworthy as it enables the detection of the timing for a processing end point, such as the stop of polishing or changes in polishing conditions. This method calculates the characteristic value of a workpiece's surface and produces a spectral waveform that relates reflection intensities to wavelengths at the processing end point. By selecting wavelengths of local maximum and minimum values of reflection intensities, Nakai has developed a system to determine and detect the processing end point effectively during the workpiece processing phase.

Career Highlights

Throughout his career, Shunsuke Nakai has been associated with prominent companies such as Ebara Corporation and Shimadzu Corporation. His expertise in surface processing and polishing methods has made him a valuable asset in the engineering sectors of these esteemed organizations.

Collaborations

Nakai has collaborated with notable professionals in his field, including Yoichi Kobayashi and Yasuo Tsukuda. These collaborations have fostered a dynamic environment for innovation, allowing for the exchange of ideas and the development of cutting-edge technologies related to surface processing.

Conclusion

Shunsuke Nakai's contributions to the field of processing technology through his inventive methodologies and collaborative spirit exemplify the essence of innovation. His 20 patents stand as a testament to his commitment to advancing industry standards and improving manufacturing processes. As technology continues to evolve, Nakai's inventions will undoubtedly play a critical role in shaping the future of processing applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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