Company Filing History:
Years Active: 2014-2023
Title: Innovations of Shunsuke Mikuriya: Pioneering Double-Sided Wafer Polishing Techniques
Introduction
Shunsuke Mikuriya is a renowned inventor based in Tokyo, Japan, celebrated for his contributions to the field of wafer polishing. With a robust portfolio of six patents, Mikuriya has made significant strides in enhancing the efficiency and effectiveness of wafer processing techniques used in semiconductor manufacturing.
Latest Patents
Among his latest innovations, Shunsuke Mikuriya has developed two notable patents focused on double-sided wafer polishing methods. The first patent outlines a double-sided polishing method wherein a wafer is compressed and held securely along with its carrier. This method involves rotating upper and lower platens while supplying slurry to the wafer. A key aspect of this invention is the preliminary measurement of the inclination value of the main surfaces of multiple carriers. This facilitates the selection of suitable carriers to ensure optimal polishing results.
The second patent details a method for double-side polishing silicon wafers, which entails a systematic approach involving multiple steps. The initial step includes supplying an alkaline aqueous solution containing abrasive grains for polishing, followed by a switching step to a second polishing agent that consists of a water-soluble polymer. This method exemplifies Mikuriya's innovative thinking, allowing for a more refined polishing process that enhances the quality of the silicon wafers.
Career Highlights
Shunsuke Mikuriya's professional journey has seen him contribute significantly to leading companies in the semiconductor industry. Notably, he has worked with Sumco Corporation and Sumico Corporation, where he has applied his expertise to develop cutting-edge polishing technologies. His experience at these esteemed organizations has laid the groundwork for his inventive pursuits, allowing him to bridge theoretical understanding with practical applications in wafer polishing.
Collaborations
Throughout his career, Mikuriya has collaborated with distinguished colleagues such as Shinichi Ogata and Ryuichi Tanimoto. These partnerships have fostered an environment of innovation and knowledge sharing, further propelling advancements in the field of wafer processing. The synergy achieved through these collaborations has led to the development of comprehensive solutions that address industry challenges.
Conclusion
In conclusion, Shunsuke Mikuriya stands as a prominent figure in the realm of semiconductor innovations. With a focus on double-sided wafer polishing methods, his patents reflect a commitment to enhancing processes that are critical to the electronics industry. Through his career and collaborations, he continues to influence advances that will shape the future of wafer manufacturing and processing.
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