The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 21, 2021

Filed:

Aug. 14, 2018
Applicant:

Sumco Corporation, Tokyo, JP;

Inventors:

Shunsuke Mikuriya, Tokyo, JP;

Tomonori Miura, Tokyo, JP;

Assignee:

SUMCO CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); B24B 37/28 (2012.01);
U.S. Cl.
CPC ...
H01L 21/02016 (2013.01); B24B 37/28 (2013.01);
Abstract

Provided a method of producing a carrier which make it possible to prevent the reduction in the flatness of a semiconductor wafer even if the semiconductor wafer is subjected to repeated double-side polishing procedures. The method of producing a carrier including a metal portion and a ring-shaped resin portion includes: a preparation step of preparing the metal portion and the resin portion (Step S); a placement step of placing the resin portion in the retainer opening in the metal portion (Step S); and a resin portion polishing step of polishing both surface of the resin portion (Step S). The method includes, prior to the resin portion polishing step (Step S), a production stage swelling step of swelling the resin portion placed in the retainer opening in the metal portion by impregnating the resin portion with a first liquid (Step S).


Find Patent Forward Citations

Loading…