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For the Inventor, By the Inventor

Koshi, Japan

Shuji Iwanaga

This inventor holds 20 USPTO granted patents and 3 published patent applications, primarily in Substrate Inspection Technology. Top assignee: Tokyo Electron Limited. Active years: 2010-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shuji Iwanaga. Retrieved from https://idiyas.com/inventor/shuji-iwanaga

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 20 

% Patents Active = 80.0

Average Co-Inventor Count = 1.8

ph-index = 3

Forward Citations = 31(Granted Patents)


Location History:

  • Minato-ku, JP (2010)
  • Kumamoto, JP (2015)
  • Koshi, JP (2011 - 2023)

Company Filing History:

goldMedal20 out of 10,904 
 
Tokyo Electron Limited
 patents

Years Active: 2010-2026

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Areas of Expertise:
Substrate Inspection
Defect Analysis
Image Processing
Film Thickness Measurement
Exposure Apparatus
Process Monitoring
Bonding Systems
Temperature Setting
20 patents (USPTO):Explore Patents
1. 12762685 - Substrate inspection device, substrate inspection system, and substrate inspection method (2026-10-13),
2. 12731241 - Information processing method, information processing apparatus, and storage medium (2026-09-08),
3. 12243213 - Substrate inspection device, substrate inspection system, and substrate inspection method (2025-03-04),
4. 11636585 - Substrate defect inspection apparatus, substrate defect inspection method, and storage medium (2023-04-25),
5. 11227381 - Substrate defect inspection apparatus, substrate defect inspection method, and storage medium (2022-01-18),
6. 10818004 - Substrate defect inspection apparatus, substrate defect inspection method, and storage medium (2020-10-27),
7. 9355442 - Film thickness measurement apparatus, film thickness measurement method, and non-transitory computer storage medium (2016-05-31),
8. 9342880 - Defect analyzing apparatus, substrate processing system, defect analyzing method and computer-readable storage medium (2016-05-17),
9. 9229337 - Setting method of exposure apparatus, substrate imaging apparatus and non-transitory computer-readable storage medium (2016-01-05),
10. 9146479 - Substrate reference image creation method, substrate defect inspection method, substrate reference image creation apparatus, substrate defect inspection unit and non-transitory computer storage medium (2015-09-29),
11. 9097681 - Inspection device, bonding system and inspection method (2015-08-04),
12. 9039863 - Substrate processing apparatus, substrate processing method, and computer readable storage medium storing substrate processing program (2015-05-26),
13. 8989477 - Process monitoring device and process monitoring method in semiconductor manufacturing apparatus and semiconductor manufacturing apparatus (2015-03-24),
14. 8874254 - Temperature setting method of heat processing plate, temperature setting apparatus of heat processing plate, program, and computer-readable recording medium recording program thereon (2014-10-28),
15. 8873849 - Image processing method, image display method, image processing apparatus and a non-transitory computer-readable recording medium (2014-10-28),

Title: Innovations by Inventor Shuji Iwanaga

Introduction

Shuji Iwanaga, a prominent inventor based in Koshi, Japan, has made significant contributions to the field of substrate inspection technology. With a total of 18 patents to his name, Iwanaga is recognized for his innovative solutions that enhance the precision and efficiency of substrate processing in manufacturing environments.

Latest Patents

Iwanaga's recent patents showcase his expertise in developing advanced substrate inspection devices and systems. One of his notable inventions is a substrate inspection apparatus designed to analyze a substrate following processing. This apparatus features an acquisition part that derives an estimated image of the substrate after processing using a machine learning model based on pre- and post-processing images, along with a determination part that identifies defects within the substrate. Additionally, Iwanaga has patented a substrate defect inspection apparatus that employs both deep learning and a rule-based system for defect classification, utilizing various image data to achieve comprehensive defect assessment.

Career Highlights

Throughout his career, Shuji Iwanaga has been affiliated with Tokyo Electron Limited, where he has leveraged his skills in technological innovation to foster advancements in substrate inspection methodologies. His work has played a crucial role in optimizing processes and improving product quality in the semiconductor industry.

Collaborations

Iwanaga has collaborated with esteemed colleagues such as Hiroshi Tomita and Tadashi Nishiyama, further enriching the innovative environment at Tokyo Electron Limited. These partnerships reflect a commitment to collective progress in the realm of substrate inspection and defect analysis technologies.

Conclusion

Shuji Iwanaga's significant achievements in patenting innovative inspection technologies highlight his role as a key figure in the advancement of manufacturing processes. His latest inventions continue to pave the way for improvements in substrate quality assurance, ensuring high standards in the semiconductor industry. With an impressive portfolio of patents, Iwanaga remains an influential inventor dedicated to pushing the boundaries of technological excellence.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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