The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 25, 2023

Filed:

Dec. 09, 2021
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventor:

Shuji Iwanaga, Koshi, JP;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06T 7/00 (2017.01); G06T 7/66 (2017.01);
U.S. Cl.
CPC ...
G06T 7/0006 (2013.01); G06T 7/0004 (2013.01); G06T 7/66 (2017.01); G06T 2207/10024 (2013.01); G06T 2207/20076 (2013.01); G06T 2207/20084 (2013.01); G06T 2207/20132 (2013.01); G06T 2207/30148 (2013.01);
Abstract

An apparatus for classifying a defect generated in a substrate, includes: a first storage part for storing a first image data for defect classification determination, which includes a defect region in which the defect is generated and a surrounding region of the defect region; a first estimation part for estimating a first type of defect by using a deep learning system, based on the first image data; a second storage part for storing a second image data for defect classification estimation, which is obtained by expressing the defect region and the surrounding region by a binarized data; a second estimation part for estimating a second type of defect by using a rule-based system, based on an attribute of the defect region extracted from the second image data; and a comprehensive determination part for comprehensively determining a type of defect based on the first and second types of defects.


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