Shu-Ming Yeh

Title: Innovations of Inventor Shu-Ming Yeh

Introduction: Shu-Ming Yeh is a notable inventor based in Tainan, Taiwan, recognized for his contributions in the field of semiconductor technology. With four patents to his name, Yeh's work focuses on advancements in fabrication methods and device architecture, showcasing significant innovation in the industry.

Latest Patents: Yeh's latest patents include a "Method for Fabricating Shallow Trench Isolation" and a "FinFET Device on Silicon-on-Insulator and Method of Forming the Same." The first patent details a method involving the formation of a trench in a substrate, followed by creating a pad layer and a dielectric layer to achieve shallow trench isolation (STI). Notably, the dry etching process utilized is a non-plasma etching method. The second patent describes a fin field effect transistor (FinFET) structure on a silicon-on-insulator substrate, featuring distinct fin structures with varying heights, which are covered by an insulating layer.

Career Highlights: Shu-Ming Yeh is associated with United Microelectronics Corporation, a key player in the semiconductor manufacturing sector. His innovative approaches have positioned him as a valuable contributor to the company's research and development efforts, particularly in enhancing semiconductor device performance and efficiency.

Collaborations: Throughout his career, Yeh has collaborated with notable colleagues, including Keng-Jen Lin and Shao-Wei Wang. These partnerships have fostered an environment of creativity and innovation, leading to the successful development of advanced technologies in semiconductor fabrication.

Conclusion: Shu-Ming Yeh's inventions reflect his dedication to advancing semiconductor technology. With his significant patent contributions and collaborative efforts, Yeh continues to play a crucial role in shaping the future of the industry, making him a prominent figure among contemporary inventors.