Hsinchu, Taiwan

Shu-Jen Chen


Average Co-Inventor Count = 2.5

ph-index = 3

Forward Citations = 64(Granted Patents)


Company Filing History:


Years Active: 1999-2015

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10 patents (USPTO):Explore Patents

Title: Innovations of Shu-Jen Chen

Introduction

Shu-Jen Chen is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of technology, particularly in the development of control methods and materials used in semiconductor processes. With a total of 10 patents to his name, Chen's work has had a substantial impact on the industry.

Latest Patents

One of his latest patents is titled "Control methods for a multi-function controller." This invention involves a sensor with a ring operation region that detects the position and force applied by an object. The system generates position, force, and rotation information to perform operations in various functional modes. Another notable patent is "Multi-film capping layer for a salicide process." This innovation features a multi-film capping layer that includes a cobalt layer, a barrier layer, and a stuffing layer. This design significantly reduces the sheet resistance of the salicide layer on gate transistors and prevents the formation of cobalt oxide during the salicide process.

Career Highlights

Shu-Jen Chen has worked with several notable companies, including United Microelectronics Corporation and Elan Microelectronics Corporation. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking technologies in the semiconductor industry.

Collaborations

Throughout his career, Chen has collaborated with talented individuals such as Ruoh-Haw Chang and Chih-Ching Hsu. These partnerships have fostered innovation and have been instrumental in the development of his patents.

Conclusion

Shu-Jen Chen's contributions to technology through his patents and collaborations highlight his role as a leading inventor in the semiconductor field. His innovative approaches continue to influence advancements in control methods and materials.

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