This inventor holds 5 USPTO granted patents and 14 published patent applications. Top assignee: Nec Corporation. Active years: 2025-2026.
Company Filing History:
Years Active: 2025-2026
Title: Shouhei Ohno: Innovator in Deterioration Analysis Technology
Introduction
Shouhei Ohno is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of deterioration analysis technology. With a total of 5 patents, his work focuses on innovative devices and methods for determining structural deterioration.
Latest Patents
Ohno's latest patents include a deterioration determination device and method, as well as a recording medium. The deterioration determination device comprises a memory and at least one processor. The processor performs operations that involve acquiring a diagnosis result of first deterioration of a structure and determining second deterioration using this result along with displacement data of the ground surface. The device outputs the second deterioration and its position. His analysis device is designed to extract geospatial information from various points on a ground surface. It trains a determination model based on height displacements and the extracted geospatial values, enabling it to identify contributing factors to height displacement.
Career Highlights
Shouhei Ohno is currently employed at NEC Corporation, where he continues to develop innovative solutions in his field. His work has garnered attention for its practical applications in infrastructure monitoring and maintenance.
Collaborations
Ohno collaborates with notable colleagues, including Hiromichi Hirata and Takakazu Ishii. Their combined expertise enhances the development of advanced technologies in deterioration analysis.
Conclusion
Shouhei Ohno's contributions to deterioration analysis technology reflect his commitment to innovation and excellence. His patents demonstrate a forward-thinking approach to structural integrity and geospatial analysis.