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For the Inventor, By the Inventor

Tokyo, Japan

Shouhei Ohno

This inventor holds 6 USPTO granted patents and 13 published patent applications. Top assignee: Nec Corporation. Active years: 2025-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shouhei Ohno. Retrieved from https://idiyas.com/inventor/shouhei-ohno

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 6 

% Patents Active = 33.3

Average Co-Inventor Count = 6.4

ph-index = 1


Company Filing History:

goldMedal6 out of 36,684 
 
Nec Corporation
 patents

Years Active: 2025-2026

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6 patents (USPTO):Explore Patents
1. 12748206 - Displacement output device, displacement output method, and recording medium (2026-09-29),
2. 12729953 - Information processing system, information processing method, and recording medium (2026-09-08),
3. 12631747 - Deterioration assessment device, deterioration assessment method, and recording medium (2026-05-19),
4. 12613332 - Information processing device, information processing method, and non-transitory computer-readable storage medium (2026-04-28),
5. 12553195 - Deterioration determination device, deterioration determination method, and recording medium (2026-02-17),
6. 12360235 - Analysis device, analysis method, and storage medium (2025-07-15),

Title: Shouhei Ohno: Innovator in Deterioration Analysis Technology

Introduction

Shouhei Ohno is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of deterioration analysis technology. With a total of 6 patents, his work focuses on innovative devices and methods for determining structural deterioration.

Latest Patents

Ohno's latest patents include a deterioration determination device and method, as well as a recording medium. The deterioration determination device comprises a memory and at least one processor. The processor performs operations that involve acquiring a diagnosis result of first deterioration of a structure and determining second deterioration using this result along with displacement data of the ground surface. The device outputs the second deterioration and its position. His analysis device is designed to extract geospatial information from various points on a ground surface. It trains a determination model based on height displacements and the extracted geospatial values, enabling it to identify contributing factors to height displacement.

Career Highlights

Shouhei Ohno is currently employed at NEC Corporation, where he continues to develop innovative solutions in his field. His work has garnered attention for its practical applications in infrastructure monitoring and maintenance.

Collaborations

Ohno collaborates with notable colleagues, including Hiromichi Hirata and Takakazu Ishii. Their combined expertise enhances the development of advanced technologies in deterioration analysis.

Conclusion

Shouhei Ohno's contributions to deterioration analysis technology reflect his commitment to innovation and excellence. His patents demonstrate a forward-thinking approach to structural integrity and geospatial analysis.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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