Miyagi, Japan

Sho Oikawa

This inventor holds 4 USPTO granted patents and 4 published patent applications. Top assignee: Tokyo Electron Limited. Active years: 2021-2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sho Oikawa. Retrieved from https://idiyas.com/inventor/sho-oikawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 4 

% Patents Active = 100.0

Average Co-Inventor Count = 3.3

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2021-2023

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4 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Sho Oikawa

Introduction

Sho Oikawa is a prominent inventor based in Miyagi, Japan. He has made significant contributions to the field of plasma processing technology. With a total of 4 patents to his name, Oikawa's work has advanced the capabilities of plasma processing apparatuses.

Latest Patents

Oikawa's latest patents include a "Processing method and plasma processing apparatus." This invention provides a method for processing an object using a plasma processing apparatus that features a stage for placing the object in a chamber, an outer peripheral member surrounding the stage, and a first power supply for applying voltage to the outer peripheral member. The method involves exposing the object to a plasma containing a precursor with deposition properties while monitoring the status of a deposition film containing carbon on the outer peripheral member. The voltage applied is controlled based on this monitored status.

Another notable patent is the "Target object processing method and plasma processing apparatus." This invention outlines a method for processing a target object using a plasma processing apparatus that includes a processing chamber and a mounting table. The method involves preparing a target object with an etching target film and a patterned mask, followed by processing the mask using plasma of a first processing gas while applying a DC voltage to the outer peripheral member.

Career Highlights

Sho Oikawa is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His work at this organization has allowed him to develop innovative solutions that enhance plasma processing techniques.

Collaborations

Oikawa has collaborated with notable coworkers such as Seiji Yokoyama and Taichi Okano. Their combined expertise has contributed to the advancement of plasma processing technologies.

Conclusion

Sho Oikawa's innovative contributions to plasma processing technology have made a significant impact in his field. His patents reflect a commitment to advancing technology and improving processing methods.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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