Osaka, Japan

Shinichi Imai

This inventor holds 30 USPTO granted patents, primarily in Semiconductor Manufacturing. Top assignees: Matsushita Electric Industrial Co., Ltd., Matsushita Electronics Corporation, Panasonic Corporation. Active years: 1994-2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shinichi Imai. Retrieved from https://idiyas.com/inventor/shinichi-imai

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 83.3

Average Co-Inventor Count = 2.0

ph-index = 10

Forward Citations = 296(Granted Patents)


Location History:

  • HiraKata, JP (2002 - 2008)
  • Osaka, JP (1994 - 2014)

Company Filing History:


Years Active: 1994-2014

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Areas of Expertise:
Nonvolatile Storage Element
Etching Method
Semiconductor Device
Substrate Processing
Plasma Processing
Chemical Vapor Deposition
Dry Etching
Apparatus
Manufacturing Method
Monitoring System
Heat Treatment
Interhalogen Compounds
30 patents (USPTO):Explore Patents

Title: Shinichi Imai: Innovator in Nonvolatile Memory Technologies

Introduction

Shinichi Imai, based in Osaka, Japan, is a prominent inventor known for his significant contributions to the field of nonvolatile memory technologies. With an impressive portfolio of 30 patents, Imai has consistently pushed the boundaries of innovation, particularly in memory element manufacturing and etching methods.

Latest Patents

Among his latest patents, Imai has developed groundbreaking technologies including a nonvolatile storage element and a method for its manufacturing. This method involves the formation of a lower electrode layer, a variable resistance layer comprising an oxygen-deficient transition metal oxide, and an upper electrode layer. A key aspect of this patent is the use of a patterned mask for etching, utilizing an etching gas containing bromine, specifically targeting the variable resistance layer.

Another notable patent focuses on an etching method for an organic/inorganic hybrid film. This process utilizes an etching gas composed of fluorine, carbon, and nitrogen to enhance the plasma etching of the film while eliminating carbon components from the surface, thereby reforming it for more effective etching.

Career Highlights

Imai's career has been marked by noteworthy positions at some of the most innovative companies in technology. He has worked at Matsushita Electric Industrial Co., Ltd. and Matsushita Electronics Corporation, where he contributed to the advancement of electronics and memory technologies.

Collaborations

Throughout his career, Imai has collaborated with esteemed colleagues in the field, including Nobuhiro Jiwari and Tokuhiko Tamaki. These partnerships have fostered an environment of innovation and creativity, leading to the development of cutting-edge technologies.

Conclusion

Shinichi Imai stands out as a leading inventor in the realm of nonvolatile memory technology. His dedication to innovation is reflected in his numerous patents and significant contributions to the industry, cementing his legacy as a key figure in advancing memory technologies. With a proven track record and a passion for discovery, Imai continues to influence the future of digital storage solutions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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