Koshi, Japan

Shingo Katsuki


Average Co-Inventor Count = 2.7

ph-index = 2

Forward Citations = 35(Granted Patents)


Company Filing History:


Years Active: 2010-2019

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3 patents (USPTO):Explore Patents

Title: Innovations by Shingo Katsuki: Advancements in Substrate Transfer and Coating Technologies

Introduction: Shingo Katsuki, an accomplished inventor based in Koshi, Japan, has made significant contributions to the field of substrate transfer and coating technologies. With a remarkable portfolio that includes three patents, Katsuki continues to push the boundaries of innovation in the semiconductor industry, particularly through his work at Tokyo Electron Limited.

Latest Patents: Among his notable innovations are two latest patents that reflect his expertise and creativity. The first is a "Substrate transfer device and bonding system," which facilitates the transfer of two substrates to a bonding apparatus. This device is composed of a first holding part to secure the first substrate from above, ensuring that its lower surface is ready for bonding. Additionally, it includes a second holding part that supports the second substrate from below, positioning it face-to-face with the first substrate for effective bonding.

The second patent is focused on a "Coating and developing apparatus, coating and developing method, and storage medium." This invention addresses the challenges of substrate-conveying accuracy by introducing a processing block that comprises multiple resist-film forming blocks and a developing block. The conveyance elements in this apparatus ensure that substrates are meticulously moved through each phase of the process, thereby enhancing efficiency and accuracy.

Career Highlights: Shingo Katsuki’s work at Tokyo Electron Limited has positioned him as a key player in the development of cutting-edge technologies. His innovative spirit and commitment to quality have contributed to advancements that are vital for improving processes within the semiconductor manufacturing sector. With his three patents, Katsuki demonstrates a strong track record of practical inventions that meet industry needs.

Collaborations: Throughout his career, Katsuki has collaborated with talented colleagues, including Yoshitaka Hara and Masataka Matsunaga. Their collective expertise fosters an environment of continuous innovation, enabling the team at Tokyo Electron Limited to remain at the forefront of technology.

Conclusion: In summary, Shingo Katsuki is an influential inventor whose work is pivotal to the evolution of substrate transfer and coating technologies. Through his innovative patents and collaborations, he is setting new standards in the semiconductor industry, illustrating the impactful role of inventors in driving technological progress. His commitment to excellence not only benefits his company but also contributes to the advancement of the industry as a whole.

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