The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 12, 2010
Filed:
Aug. 25, 2008
Yoshitaka Hara, Koshi, JP;
Shingo Katsuki, Koshi, JP;
Yoshitaka Hara, Koshi, JP;
Shingo Katsuki, Koshi, JP;
Tokyo Electron Limited, Tokyo-To, JP;
Abstract
Disclosed herein is a coating and developing apparatuswhose decreases in substrate-conveying accuracy can be suppressed. A processing block Sof the coating and developing apparatusincludes multiple resist-film forming blocks G, G, and a developing block G. A conveyance elementfor substrate loading into the processing block Sis provided to convey substrates W from a carrier C to the resist-film forming blocks G, G. Also, a conveyance element I for substrate loading into an exposure apparatus Sis provided in an interface block Sto load the substrates W into the exposure apparatus Sand after unloading the substrates W from the exposure apparatus S, convey the substrates W to the developing block G. The processing block loading conveyance elementconveys the substrates W, one at a time, from the carrier C to each resist-film forming block G, G, sequentially and periodically, and the exposure apparatus loading conveyance element I loads the substrates W from each resist-film forming block G, Ginto the exposure apparatus Sin the sequence that each has been conveyed to the resist-film forming block G, Gby the processing block loading conveyance element