Tokyo Electron Limited

Shingo Katsuki

Yoshitaka Hara

Masataka Matsunaga

Yasuharu Iwashita

Kazutoshi Ishimaru

Takahiro Masunaga

Takashi Koga

Masaaki Umitsuki

Fumio Sakata

A substrate transfer device for transferring a first substrate and a second substrate to a bonding apparatus configured to bond the first substrate and the second substrate, includes a first holding part configured to hold the first substrate from an upper surface side, a lower surface of the first substrate serving as a bonding surface, and a second holding part provided below the first holding part and configured to hold the second substrate from a lower surface side so that the second substrate faces the first substrate, a upper surface of the second substrate serving as a bonding surface to be bonded to the lower surface of the first substrate.

Substrate transfer device and bonding system

Disclosed herein is a coating and developing apparatuswhose decreases in substrate-conveying accuracy can be suppressed. A processing block Sof the coating and developing apparatusincludes multiple resist-film forming blocks G, G, and a developing block G. A conveyance elementfor substrate loading into the processing block Sis provided to convey substrates W from a carrier C to the resist-film forming blocks G, G. Also, a conveyance element I for substrate loading into an exposure apparatus Sis provided in an interface block Sto load the substrates W into the exposure apparatus Sand after unloading the substrates W from the exposure apparatus S, convey the substrates W to the developing block G. The processing block loading conveyance elementconveys the substrates W, one at a time, from the carrier C to each resist-film forming block G, G, sequentially and periodically, and the exposure apparatus loading conveyance element I loads the substrates W from each resist-film forming block G, Ginto the exposure apparatus Sin the sequence that each has been conveyed to the resist-film forming block G, Gby the processing block loading conveyance element

Coating and developing apparatus, coating and developing method, and storage medium

Growing community of inventors

Koshi, Japan

Shingo Katsuki