Taichung, Taiwan

Shih-Wei Bih

This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2017-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shih-Wei Bih. Retrieved from https://idiyas.com/inventor/shih-wei-bih-s141ch17

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

% Patents Active = 50.0

Average Co-Inventor Count = 5.1

ph-index = 1


Company Filing History:


Years Active: 2017-2024

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2 patents (USPTO):Explore Patents

Title: Shih-Wei Bih: Innovator in Semiconductor Technology

Introduction

Shih-Wei Bih is a prominent inventor based in Taichung, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on advancements in physical vapor deposition (PVD) processes, which are crucial for the manufacturing of semiconductor devices.

Latest Patents

Shih-Wei Bih's latest patents include innovative designs that enhance the efficiency and effectiveness of PVD processes. One of his patents is titled "PVD target design and semiconductor devices formed using the same." This patent describes a PVD target that includes a backing plate and a target plate, which is coupled to the backing plate. The target plate contains a sputtering source material and a dopant, ensuring that the dopant is not merely impurities in the sputtering source material. Additionally, the sputtering source material incorporates a diffusion barrier material.

Another notable patent is "Process kit of physical vapor deposition chamber and fabricating method thereof." This patent outlines a PVD chamber that includes a sputtering target, a power supply, a process kit, and a substrate support. The sputtering target has a sputtering surface that interacts with a process region, while the power supply is electrically connected to the sputtering target. The process kit features an inner surface that partially encloses the process region, along with a liner layer that is disposed on the inner surface.

Career Highlights

Shih-Wei Bih is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this company has allowed him to contribute to cutting-edge technologies that drive advancements in semiconductor manufacturing.

Collaborations

Shih-Wei Bih has collaborated with several talented individuals in his field, including Yen-Yu Chen and Chia-Hsi Wang. These collaborations have fostered innovation and have led to the development of new technologies in semiconductor processes.

Conclusion

Shih-Wei Bih is a key figure in the semiconductor industry, with a focus on improving PVD processes through his innovative patents. His contributions continue to shape the future of semiconductor technology, making him a notable inventor in this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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