Shih-Chun Chen

Title: Shih-Chun Chen: Innovator in Integrated Circuit Design

Introduction

Shih-Chun Chen is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of integrated circuit design, holding a total of 3 patents. His innovative work focuses on enhancing the functionality and efficiency of electronic devices.

Latest Patents

One of his latest patents is a cover system that includes a comprehensive design featuring a face cover, neck cover, crown cover, side cover, and back cover. This invention allows for the creation of a cover opening above the face cover, enabling the exposure of facial features while also incorporating a helmet cover that expands around a helmet. Another significant patent is a method for legalizing mixed-cell height standard cells of integrated circuits (IC). This method involves obtaining a global placement of the IC, moving standard cells to the nearest row, and dividing the global placement into windows based on displacement values to achieve a detailed placement for manufacturing.

Career Highlights

Shih-Chun Chen has worked with Taiwan Semiconductor Manufacturing Company Limited, where he has honed his skills and contributed to various projects. His expertise in integrated circuit design has positioned him as a valuable asset in the industry.

Collaborations

Throughout his career, Shih-Chun has collaborated with talented individuals such as Chao-Hung Wang and Yen-Yi Wu, who is a prominent woman in the field. These collaborations have further enriched his work and expanded his innovative reach.

Conclusion

Shih-Chun Chen's contributions to integrated circuit design and his innovative patents reflect his dedication to advancing technology. His work continues to influence the industry and inspire future innovations.