The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 15, 2020
Filed:
Feb. 15, 2017
Applicants:
LI Ray Chen, Taipei, TW;
Shih-chun Chen, Taipei, TW;
Inventors:
Li Ray Chen, Taipei, TW;
Shih-Chun Chen, Taipei, TW;
Assignee:
Other;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
A42B 3/00 (2006.01); A42B 3/22 (2006.01); A41D 27/00 (2006.01); A41D 13/11 (2006.01);
U.S. Cl.
CPC ...
A42B 3/003 (2013.01); A41D 13/1153 (2013.01); A41D 27/00 (2013.01); A42B 1/006 (2013.01); A42B 1/046 (2013.01); A42B 3/22 (2013.01);
Abstract
A method and apparatus can include: providing a cover, the cover including face cover, neck cover, crown cover, side cover, and back cover; creating a cover opening in the cover above the face cover for exposure of facial features of a user from the cover; attaching a helmet cover at an attachment point near the back cover configured to expand around a helmet; and forming a helmet cover opening.
Chen, Li. (2020). Cover system (U.S. Patent No. 10863787). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10863787
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile