Shih-Ching Chen

Title: Innovations of Inventor Shih-Ching Chen

Introduction

Shih-Ching Chen is a notable inventor based in Nantou Hsien, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 7 patents. His work focuses on improving the efficiency and quality of semiconductor manufacturing processes.

Latest Patents

One of his latest patents is a method of forming a shallow trench isolation structure. This invention provides a concave shallow trench isolation structure, along with a fabricating method that features concave bottom corners. The concave shape of the structure prevents stress centralization, thereby avoiding leakage current or punch-through in the source/drain regions. Another significant patent is a method of coating an amorphous silicon film. This method involves directly depositing an amorphous silicon layer on polysilicon nodes using a self-aligned approach. A chemical mechanical polishing process is then performed to control the thickness of the amorphous silicon layer, eliminating the need for additional photoresist during the entire process. This innovation reduces deposition time and enhances the quality of the amorphous silicon film.

Career Highlights

Shih-Ching Chen has worked with prominent companies in the semiconductor industry, including United Semiconductor Corporation and United Microelectronics Corporation. His experience in these organizations has allowed him to develop and refine his innovative techniques in semiconductor manufacturing.

Collaborations

Throughout his career, Shih-Ching has collaborated with talented individuals such as Guan-Jiun Liu and Chi-Jui Sung. These collaborations have contributed to the advancement of his inventions and the overall progress in the field.

Conclusion

Shih-Ching Chen's contributions to semiconductor technology through his innovative patents and collaborations highlight his importance as an inventor. His work continues to influence the industry and improve manufacturing processes.