Tainan, Taiwan

Shih-Chang Shih

USPTO Granted Patents = 15 

Average Co-Inventor Count = 3.8

ph-index = 3

Forward Citations = 32(Granted Patents)


Location History:

  • Hsin-Chu, TW (2000 - 2023)
  • Tai-Nan, TW (2001 - 2024)

Company Filing History:


Years Active: 2000-2025

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15 patents (USPTO):Explore Patents

Title: Innovations of Inventor Shih-Chang Shih in Semiconductor Technology

Introduction: Shih-Chang Shih, an esteemed inventor based in Tainan, Taiwan, has made significant contributions to the semiconductor industry. With a noteworthy portfolio of 14 patents, he is recognized for his innovative solutions that address complex challenges in semiconductor manufacturing. His work reflects the intersection of engineering and cutting-edge technology, aimed at enhancing efficiency and safety in production processes.

Latest Patents: Among his latest patents, Shih-Chang Shih has developed an "Exhaust System with U-Shaped Pipes." This system is designed to discharge hazardous gases from semiconductor manufacturing equipment safely. The innovative exhaust system includes a main exhaust pipe positioned above the equipment, as well as branch pipes for efficient gas management and a detector for identifying hazardous gases. Additionally, he has contributed to the development of an "EUV Lithography Mask with a Porous Reflective Multilayer Structure." This lithography mask features a substrate made from low thermal expansion material (LTEM) and a unique multilayer reflective structure, enhancing precision in semiconductor manufacturing.

Career Highlights: Shih-Chang Shih is associated with Taiwan Semiconductor Manufacturing Company Limited (TSMC), a leading player in the semiconductor industry. His groundbreaking inventions have directly contributed to TSMC's reputation for technological excellence and innovation. His extensive experience in the field has established him as a key inventor, paving the way for advanced semiconductor processes.

Collaborations: Throughout his career, Shih-Chang Shih has collaborated with esteemed colleagues, including Li-Jui Chen and Po-Chung Cheng. Working alongside talented professionals enhances the depth of expertise in his projects, fostering innovation and advanced technological solutions in the semiconductor domain.

Conclusion: Shih-Chang Shih's dedication to innovation in semiconductor technology exemplifies his role as a leading inventor. With 14 patents to his name, his significant contributions continue to influence the future of semiconductor manufacturing. As technology evolves, Shih's inventions will likely remain at the forefront, driving advancements in the industry and ensuring the continued progress of semiconductor technologies.

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