The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 14, 2020
Filed:
Oct. 16, 2019
Applicant:
Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;
Inventors:
Zi-Wen Chen, Taichung, TW;
Po-Chung Cheng, Chiayi County, TW;
Chih-Tsung Shih, Hsinchu, TW;
Li-Jui Chen, Hsinchu, TW;
Shih-Chang Shih, Tainan, TW;
Assignee:
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD., Hsinchu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G01B 11/27 (2006.01); G03F 9/00 (2006.01); G01M 11/02 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70925 (2013.01); G01B 11/272 (2013.01); G01M 11/0271 (2013.01); G03F 7/7085 (2013.01); G03F 7/70666 (2013.01); G03F 7/70975 (2013.01); G03F 9/7046 (2013.01); G03F 9/7096 (2013.01);
Abstract
Embodiments described herein provide a method for cleaning contamination from sensors in a lithography tool without requiring recalibrating the lithography tool. More particularly, embodiments described herein teach cleaning the sensors using hydrogen radicals for a short period while the performance drifting is still above the drift tolerance. After a cleaning process described herein, the lithography tool can resume production without recalibration.