The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 23, 2004

Filed:

Oct. 05, 2002
Applicant:
Inventors:

Jain-Fa Lin, Yung Kang, TW;

Shih-Chang Shih, Tainan, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01L 7/10 ;
U.S. Cl.
CPC ...
G01L 7/10 ;
Abstract

A pressure differential measuring tool which includes a wafer container having a pressure difference meter provided in fluid communication therewith. In use, the wafer container is placed in the indexer of the process tool, which is operated according to normal operational parameters. The pressure difference meter measures the difference in pressure between the air in the indexer, which equalizes with pressure in the wafer container, and the ambient or atmospheric air surrounding the chamber, which equalizes with the pressure of the air in the process chamber. The air pressure in the indexer can then be adjusted to a value higher than the ambient or atmospheric air pressure to prevent influx of air and particles from the process chamber into the indexer and wafer container.


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