The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 14, 2001
Filed:
Jun. 01, 1999
Shih-Chang Shih, Tai-Nan, TW;
Yung-Dar Chen, Hsin-Chu, TW;
Fu-Shun Lo, Hsin-Chu, TW;
Wen-Hsiung Wu, Tung-shih, TW;
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin Chu, TW;
Abstract
An apparatus and a method for trapping a toxic gas contained in an exhaust gas from a process chamber are disclosed. In the apparatus, two toxic gas traps are provided which are connected in series with a toxic gas sensor provided thereinbetween and in fluid communication with the two traps. When toxic gas is detected by the toxic gas sensor, i.e., an indication that the first toxic gas trap is fully consumed, the second toxic gas trap is used to replace the first toxic gas trap, while a new toxic gas trap is installed as the second toxic gas trap. The present invention novel apparatus and method enables the full use or utilization of a toxic gas trap and results in significant cost savings. Furthermore, the present invention novel apparatus and method improves the yield of a fabrication process by reducing the machine down time since the service frequency for the chamber is reduced.