Shigeru Yokoi

This inventor holds 14 USPTO granted patents and 2 published patent applications, primarily in Lithography Techniques. Top assignees: Tokyo Ohka Kogyo Co., Ltd., Intel Corporation. Active years: 2002-2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shigeru Yokoi. Retrieved from https://idiyas.com/inventor/shigeru-yokoi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

USPTO Granted Patents = 14 (Patent Applications = 2)

% Patents Active = 71.4

Average Co-Inventor Count = 3.1

ph-index = 2

Forward Citations = 21(Granted Patents)

Location History:

Kanagawa, JP (2002 - 2013)
Kanagawa-ken, JP (2006 - 2014)
Kawasaki, JP (2012 - 2016)

Company Filing History:

14 out of 1,236

Tokyo Ohka Kogyo Co., Ltd.

where one patent can have more than one assignee

Years Active: 2002-2016

Loading Chart...

Areas of Expertise:

Photoresist Stripping

Cleaning Liquid

Lithography

Protective Film

Semiconductor Substrate

Resist Pattern

Dual Damascene

Antireflective Coating

Coating Composition

Negative Resist

Wiring Formation

14 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 9352542 - Processing method and processing apparatus (2016-05-31),

2. 8859187 - Method of forming resist pattern and negative resist composition (2014-10-14),

3. 8697345 - Photoresist stripping solution and a method of stripping photoresists using the same (2014-04-15),

4. 8685910 - Cleaning liquid used in photolithography and a method for treating substrate therewith (2014-04-01),

5. 8354365 - Cleaning liquid for lithography and method for forming wiring (2013-01-15),

6. 8354215 - Method for stripping photoresist (2013-01-15),

7. 8192923 - Photoresist stripping solution and a method of stripping photoresists using the same (2012-06-05),

8. 8158568 - Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewith (2012-04-17),

9. 8114825 - Photoresist stripping solution (2012-02-14),

10. 8097397 - Material for formation of protective film, method for formation of photoresist pattern, and solution for washing/removal of protective film (2012-01-17),

11. 7442675 - Cleaning composition and method of cleaning semiconductor substrate (2008-10-28),

12. 7129020 - Liquid coating composition for forming a top antireflective film and photoresist laminate using the same, as well as method for forming photoresist pattern (2006-10-31),

13. 6746963 - Method for processing coating film and method for manufacturing semiconductor element with use of the same method (2004-06-08),

14. 6416930 - Composition for lithographic anti-reflection coating, and resist laminate using the same (2002-07-09),

Title: The Innovative Contributions of Shigeru Yokoi

Introduction: Shigeru Yokoi, a prominent inventor based in Kanagawa-ken, Japan, is celebrated for his remarkable contributions to technological advancements, demonstrated through his impressive portfolio of 14 patents. His inventive spirit and proficiency in materials and methods have significantly impacted various industries, particularly those relying on adhesion and resist pattern formation.

Latest Patents: Among Yokoi's latest inventions are two notable patents that address complex challenges in processing methods. The first patent details a bonding method that includes an adhesive layer forming process. This process entails applying a thermoplastic adhesive to a substrate or support plate, followed by the heating of the adhesive layer and the subsequent pressing of the substrate and support plate together, resulting in a secure bond. The second patent introduces a novel method for forming a resist pattern, aimed at reducing thickness loss in resist patterns. This method incorporates a negative resist composition and a series of precise steps involving the application and selective exposure of resist films, ensuring enhanced accuracy and efficiency in pattern formation.

Career Highlights: Yokoi has built an impressive career working with leading companies, including Tokyo Ohka Kogyo Co., Ltd. and Intel Corporation. His work at these esteemed organizations has allowed him to leverage his innovative skills and contribute to cutting-edge developments in materials science and engineering.

Collaborations: Throughout his career, Shigeru Yokoi has collaborated with talented individuals such as Kazumasa Wakiya and Takayuki Haraguchi. These partnerships have enriched his research and fostered an environment of creativity and knowledge-sharing, paving the way for notable advancements in their respective fields.

Conclusion: Shigeru Yokoi's inventive journey showcases his dedication to innovation and excellence in technology. With a focus on enhancing adhesion processes and resist pattern formation, his contributions not only highlight his technical prowess but also serve as an inspiration to future inventors in the field. As he continues to innovate, Yokoi remains a pivotal figure in advancing the boundaries of technology.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

2 patents pending: