Shigeru Ohno

Title: Shigeru Ohno: Innovating the Display Device and Surface Treatment Technologies

Introduction:

Shigeru Ohno, a highly accomplished inventor and researcher based in Yokohama, Japan, has made significant contributions to the field of display technology and surface treatment processes. With an impressive record of 128 patents to his name, Ohno has been instrumental in developing advanced solutions that have revolutionized the way we perceive and interact with visual interfaces. This article explores his latest patents, highlights his career accomplishments, and examines his notable collaborations.

Latest Patents:

One of Shigeru Ohno's recent patents is a display device that addresses the challenge of forming a semiconductor layer pattern to a predetermined size, even when the distance between the electrodes on top of the semiconductor layer is relatively large. This innovative display device enhances the manufacturing process by utilizing a photoresist reflow technology to achieve precise dimensions. By incorporating a semiconductor layer pattern on an insulating substrate or an insulating film layer, along with multiple electrodes, the display device ensures optimal alignment and accurate formation of elements.

Another notable patent from Ohno focuses on the surface treatment of solid surfaces and substrate surfaces. By utilizing an atomic-oxygen-donating gas, such as ozone, Ohno's process effectively and efficiently etches metals and their oxides like ruthenium and osmium. This technique offers rapid and damage-free etching solutions, ensuring the stable operation of reactors, the production of high-quality devices, and the cleanliness of wafer surfaces and reactor chambers.

Career Highlights:

Throughout his career, Shigeru Ohno has made significant contributions in both the academic and industrial realms. He has worked with renowned companies such as Fuji Photo Film Company, Limited (now Fujifilm) and Canon Kabushiki Kaisha (Canon) to advance technology in various domains. His expertise and innovative mindset have played a critical role in enhancing the research and development activities of these organizations. Ohno's dedication to his work is evident in his wide range of patents, which highlight his commitment to pushing boundaries and finding practical solutions.

Collaborations:

Shigeru Ohno has had the privilege of collaborating with esteemed researchers and inventors over the years. Notable coworkers include Keishi Saitoh and Yukihiko Ohnuki. It is through these collaborations that Ohno has been able to combine his expertise with that of others, resulting in novel inventions and advancements. By leveraging cross-disciplinary knowledge and sharing ideas, Ohno and his collaborators have collectively contributed to the growth and development of various industries.

Conclusion:

Shigeru Ohno's passion for innovation and his pursuit of excellence has been integral in shaping advancements in the fields of display technology and surface treatment processes. His latest patents demonstrate his ability to solve complex challenges and his commitment to pushing the boundaries of what is possible. With a remarkable career spanning multiple prestigious organizations and fruitful collaborations, Ohno's contributions have undoubtedly made a lasting impact on inventors, researchers, and industries as a whole.