The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 11, 2006
Filed:
Jun. 13, 2003
Miwako Nakahara, Yokohama, JP;
Toshiyuki Arai, Machida, JP;
Shigeru Ohno, Yokohama, JP;
Takashi Yunogami, Niiza, JP;
Sukeyoshi Tsunekawa, Iruma, JP;
Kazuto Watanabe, Kokubunji, JP;
Miwako Nakahara, Yokohama, JP;
Toshiyuki Arai, Machida, JP;
Shigeru Ohno, Yokohama, JP;
Takashi Yunogami, Niiza, JP;
Sukeyoshi Tsunekawa, Iruma, JP;
Kazuto Watanabe, Kokubunji, JP;
Renesas Technology Corp., Tokyo, JP;
Abstract
Ruthenium, osmium and their oxides can be etched simply and rapidly by supplying an atomic oxygen-donating gas, typically ozone, to the aforementioned metals and their oxides through catalysis between the metals and their oxides, and the ozone without any damages to wafers and reactors and application of the catalysis not only to the etching but also to chamber cleaning ensures stable operation of reactors and production of high quality devices.