Sheng-Yueh Chang

Title: Innovations of Sheng-Yueh Chang

Introduction

Sheng-Yueh Chang is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of chemical engineering, particularly in the development of resist compositions used in semiconductor manufacturing. With a total of 6 patents to his name, Chang's work has had a notable impact on the industry.

Latest Patents

One of his latest patents is titled "Ammonium salt of organic acid and resist composition containing the same." This invention provides a novel ammonium salt of an organic acid that enhances the environmental stability of chemically amplified resists. It effectively prevents the T-top phenomenon and mitigates line width changes caused by acid diffusion, ultimately decreasing the E value of the resist. Another significant patent is "Polymer with a pericyclic protective group and resist composition containing the same." This invention relates to a polymer featuring at least one pericyclic protective group, such as 2-methyl-2-bicyclo[2,2,1]heptanyl. The resist composition derived from this polymer exhibits strong etch resistance and successfully resolves a line-and-space pattern of 0.1 µm pitch.

Career Highlights

Throughout his career, Sheng-Yueh Chang has worked with notable companies, including United Microelectronics Corporation. His expertise in the field has allowed him to contribute to advancements in semiconductor technology.

Collaborations

Chang has collaborated with esteemed colleagues such as Jian-Hong Chen and Bang-Chein Ho. These partnerships have further enriched his research and development efforts.

Conclusion

Sheng-Yueh Chang's innovative work in resist compositions and polymers has significantly advanced the semiconductor industry. His contributions continue to influence the field, showcasing the importance of innovation in technology.