The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 03, 2003
Filed:
Mar. 09, 2001
Applicant:
Inventors:
Sheng-Yueh Chang, Taipei Hsien, TW;
Jian-Hong Chen, Hsinchu, TW;
Ting-Chun Liu, Hsinchu, TW;
Tzu-Yu Lin, Hsinchu Hsien, TW;
Wen-Yuang Tsai, Taoyuan Hsien, TW;
Assignee:
Other;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 ; C07D / ; C07C / ;
U.S. Cl.
CPC ...
G03F 7/004 ; C07D / ; C07C / ;
Abstract
The present invention provides a novel ammonium salt of an organic acid. When the salt is used as a base additive for a chemically amplified resist, the environmental stability of the resist can be enhanced, and the T-top phenomenon can be effectively prevented. In addition, the line width change caused by acid diffusion can be prevented, and the E value of the resist can be decreased.