The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 25, 2003
Filed:
Feb. 28, 2000
Applicant:
Inventors:
Sheng-Yueh Chang, Taipei Hsien, TW;
Bang-Chein Ho, Hsinchu, TW;
Jui-Fa Chang, Hsinchu, TW;
Jian-Hong Chen, Hsinchu, TW;
Ming-Chia Tai, Keelung, TW;
Assignee:
Other;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 3/402 ;
U.S. Cl.
CPC ...
C08F 3/402 ;
Abstract
The present invention relates to a polymer with at least one pericyclic protective group such as 2-methyl-2-bicyclo[2,2,1]heptanyl. The resist composition containing the polymer can be used as a chemically amplified resist and exhibits strong etch resistance. In addition, a line-and-space pattern of 0.1 &mgr;m pitch can be resolved successfully using the resist composition.