Sheng-Kai Su

Title: Innovations of Sheng-Kai Su in Semiconductor Technology

Introduction

Sheng-Kai Su is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His work focuses on advanced manufacturing methods that enhance the performance and efficiency of semiconductor devices.

Latest Patents

One of his latest patents is titled "Semiconductor device and manufacturing method thereof." This method involves forming a semiconductor fin that protrudes above a substrate, followed by the creation of a first 2D material layer across the fin. The process continues with the deposition of a gate material layer, etching to form a gate structure, and laterally growing a second 2D material layer. The final steps include forming gate spacers and a third 2D material layer, resulting in a combination that comprises at least three or more monolayers of PtSe.

Another notable patent is "Forming 3D transistors using 2D Van Der Waals materials." This method includes etching a dielectric layer to create a dielectric fin, depositing a transition metal dichalcogenide layer, and performing an anisotropic etching process. The result is a vertical semiconductor ring, which is further enhanced by forming a gate stack and a source/drain contact plug.

Career Highlights

Sheng-Kai Su is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he continues to innovate in semiconductor manufacturing processes. His expertise in 2D materials and transistor technology positions him as a key figure in the industry.

Collaborations

He collaborates with Jin Cai, contributing to advancements in semiconductor technology through their combined expertise.

Conclusion

Sheng-Kai Su's innovative work in semiconductor technology, particularly in the development of advanced manufacturing methods, showcases his significant impact on the field. His contributions continue to shape the future of semiconductor devices.