Shanghai, China

Shena Jia

USPTO Granted Patents = 9 

Average Co-Inventor Count = 7.2

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2019-2025

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9 patents (USPTO):

Title: Innovations of Shena Jia in Substrate Cleaning Technologies

Introduction

Shena Jia is a prominent inventor based in Shanghai, China, known for her significant contributions to substrate cleaning technologies. With a total of eight patents to her name, she has developed innovative methods that enhance the efficiency and effectiveness of cleaning processes in various applications.

Latest Patents

Among her latest patents is a method and apparatus for removing particles or photoresist on substrates. This method involves transferring substrates into a DIO solution and subsequently into an SPM solution, allowing for effective removal of particles and photoresist, particularly those treated by medium or high doses of ion implantation. Another notable patent focuses on cleaning substrates using high-temperature chemicals and an ultrasonic device. This method includes rotating the substrate, applying deionized water, and utilizing a high-temperature chemical solution, followed by ultrasonic cleaning cycles to ensure thorough cleaning and drying of the substrate.

Career Highlights

Shena Jia is currently employed at Acm Research (Shanghai) Inc., where she continues to innovate in the field of substrate cleaning technologies. Her work has significantly impacted the industry, providing solutions that improve cleaning efficiency and substrate quality.

Collaborations

Shena collaborates with talented individuals such as Hui Wang and Fuping Chen, contributing to a dynamic team focused on advancing substrate cleaning technologies.

Conclusion

Shena Jia's innovative approaches to substrate cleaning have established her as a leading inventor in her field. Her patents reflect a commitment to enhancing cleaning processes, making significant strides in technology.

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