Company Filing History:
Years Active: 2002-2004
Title: Innovations of Shao-Chung Hsu in Semiconductor Fabrication
Introduction
Shao-Chung Hsu is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor fabrication, holding 2 patents that focus on improving the efficiency and accuracy of integrated circuit production.
Latest Patents
One of his latest patents is titled "Critical dimension statistical process control in semiconductor fabrication." This invention provides a method for analyzing process variations that occur during integrated circuit fabrication. Critical dimension data is collected for each layer of the integrated circuit fabrication process over a period of time. A shift indicator is calculated to indicate variation in the critical dimension data for each layer. Additionally, a machine drift significance indicator is calculated for each machine used in the fabrication process, and a maximum shift of mean value for each layer is defined. These indicators are utilized to determine at least one likely cause of variation in critical dimension for each layer of the integrated circuit fabrication process.
Another significant patent is the "Procedure of alignment for optimal wafer exposure pattern." This invention includes a computer-based procedure and apparatus designed to expose cells on the surface of a wafer to maximize the number of dies produced. It is particularly useful for the exposure of six and eight-inch wafers, as well as larger wafers.
Career Highlights
Shao-Chung Hsu is currently associated with Macronix International Co., Ltd., where he continues to innovate in the semiconductor industry. His work has been instrumental in enhancing the production processes and yield of semiconductor devices.
Collaborations
He has collaborated with notable coworkers such as Chih-Ping Chen and Chen-Fu Chien, contributing to advancements in semiconductor technology.
Conclusion
Shao-Chung Hsu's contributions to semiconductor fabrication through his innovative patents demonstrate his commitment to improving technology in this critical field. His work continues to influence the efficiency and effectiveness of integrated circuit production.
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