Shang-Syuan Ciou

Title: Outstanding Innovations of Inventor Shang-Syuan Ciou

Introduction: Shang-Syuan Ciou, an accomplished inventor based in Hsinchu, Taiwan, has made significant contributions to the field of semiconductor technology. With a total of six patents to his name, Ciou's innovations have undoubtedly advanced the industry and improved the performance of various semiconductor devices.

Latest Patents: Ciou's recent patents showcase his cutting-edge work in integrated circuit layouts. His patent titled "Integrated circuit layouts with source and drain contacts of different widths" describes a sophisticated system for processing semiconductor device layouts. The system includes a processor and a computer-readable storage medium, designed to generate active region layout patterns, gate layout patterns, and source/drain region layout patterns in an efficient manner. Additionally, he has developed a method for creating semiconductor devices that feature self-aligned interconnect structures, enhancing electrical connectivity and performance.

Career Highlights: Ciou currently works at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His experience and technical expertise have led to impactful contributions to the company's product offerings and technological advancements.

Collaborations: Throughout his career, Ciou has collaborated with several esteemed colleagues, including Hui-Zhong Zhuang and Chih-Yu Lai. These collaborations have fostered an innovative environment, allowing for the sharing of knowledge and ideas, further propelling advancements in semiconductor technology.

Conclusion: With his notable patents and ongoing research, Shang-Syuan Ciou stands as a significant figure in the realm of semiconductor innovations. His work exemplifies the critical role inventors play in driving technology forward, making valuable contributions that benefit various industries.