Hillsboro, OR, United States of America

Shakul Tandon

USPTO Granted Patents = 5 

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2019-2025

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5 patents (USPTO):Explore Patents

Title: Shakul Tandon: Innovator in Semiconductor Technology

Introduction

Shakul Tandon is a prominent inventor based in Hillsboro, Oregon, known for his significant contributions to semiconductor technology. With a total of five patents to his name, Tandon has made strides in developing innovative solutions that enhance the performance and reliability of electronic devices.

Latest Patents

One of Tandon's latest patents is titled "Hermetic barrier surrounding a plurality of dies." This invention relates to apparatuses, processes, and techniques for creating a barrier that surrounds one or more dies, which are electrically coupled with connections on a wafer. The hermetic barrier is designed to prevent moisture intrusion that could compromise the electrical connections. Another notable patent is "Fill pattern to enhance ebeam process margin." This patent describes lithographic apparatuses suitable for complementary e-beam lithography (CEBL). The method involves forming a pattern of parallel lines above a substrate and aligning it in an e-beam tool to ensure precision during the scanning process.

Career Highlights

Shakul Tandon is currently employed at Intel Corporation, where he continues to push the boundaries of semiconductor innovation. His work at Intel has positioned him as a key player in the development of advanced technologies that are critical to the electronics industry.

Collaborations

Tandon has collaborated with notable colleagues, including Mark C. Phillips and Shem Ogadhoh, contributing to a dynamic team focused on advancing semiconductor technologies.

Conclusion

Shakul Tandon's innovative work in semiconductor technology, particularly through his patents, showcases his commitment to enhancing electronic device performance. His contributions at Intel Corporation and collaborations with esteemed colleagues further solidify his reputation as a leading inventor in the field.

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