Tokyo, Japan

Shahedul Hoque

This inventor holds 19 USPTO granted patents and 1 published patent application, primarily in Charged Particle Beam Technology. Top assignees: Hitachi High-Tech Corporation, Hitachi-High-Technologies Corporation. Active years: 2013-2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shahedul Hoque. Retrieved from https://idiyas.com/inventor/shahedul-hoque

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 19 

% Patents Active = 89.5

Average Co-Inventor Count = 4.2

ph-index = 3

Forward Citations = 32(Granted Patents)


Location History:

  • Hitachinaka, JP (2013 - 2019)
  • Tokyo, JP (2017 - 2023)

Company Filing History:


Years Active: 2013-2023

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Areas of Expertise:
Charged Particle Beam
Electron Beam Irradiation
Scanning Electron Microscope
Charged Particle Detector
Inspection Scan Direction
Light Guide
Beam Apparatus
Dose Control
Particle Beam System
19 patents (USPTO):Explore Patents

Title: Shahedul Hoque - Innovative Inventor from Tokyo

Introduction: Shahedul Hoque is a renowned inventor based in Tokyo, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Shahedul Hoque holds several patents in the areas of artificial intelligence, robotics, and renewable energy technologies, showcasing his versatility and forward-thinking approach to invention.

Career Highlights: With a career spanning over two decades, Shahedul Hoque has worked with leading tech companies in Japan, spearheading research and development projects that have led to significant advancements in various industries.

Collaborations: Throughout his career, Shahedul Hoque has collaborated with top researchers, engineers, and scientists both locally and internationally, fostering a culture of innovation and knowledge sharing.

Conclusion: Shahedul Hoque's passion for innovation and his relentless pursuit of technological advancement continue to inspire the next generation of inventors and entrepreneurs worldwide.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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