Hitachi High-tech Corporation

Hitachi-high-technologies Corporation

Shahedul Hoque

Hajime Kawano

Hiroyuki Takahashi

Shunsuke Mizutani

Kumiko Shimizu

Hideyuki Kazumi

Toshiyuki Yokosuka

Shin Imamura

Chahn Lee

Yoshifumi Sekiguchi

Uki Ikeda

Makoto Suzuki

Hideki Itai

Hiroshi Nishihama

Minoru Yamazaki

Takashi Ohshima

Akio Yamamoto

Wen Zheng Li

Tomonobu Tsuchiya

Yoshinori Momonoi

Kazuki Ikeda

Wataru Mori

Shinya Ueno

Shaungqi Dong

Susumu Koyama

The scanning charged particle beam microscope according to the present application is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation points than when the charged particle beam irradiates a position on the sample corresponding to each of the irradiation points (a position on the sample corresponding to each pixel detecting a signal). This allows the effects from a micro-domain electrification occurring within the FOV to be mitigated or controlled.

Charged particle beam device

A charged particle beam apparatus covering a wide range of detection angles of charged particles emitted from a sample includes an objective lens for converging charged particle beams emitted from a charged particle source and a detector for detecting charged particles emitted from a sample. The objective lens includes inner and outer magnetic paths which are formed so as to enclose a coil. A first inner magnetic path is disposed at a position opposite to an optical axis of the charged particle beams. A second inner magnetic path, formed at a slant with respect to the optical axis of the charged particle beams, includes a leading end. A detection surface of the detector is disposed at the outer side from a virtual straight line that passes through the leading end and that is parallel to the optical axis of the charged particle beams.

Charged particle beam apparatus

A charged particle beam apparatus using a light guide that improves light utilization efficiency includes a detector including a scintillator for emitting light when a charged particle is incident, a light receiving element, and a light guide for guiding the light from the scintillator to the light receiving element. The light guide includes: an incident surface that faces a light emitting surface of the scintillator and to which the light emitted by the scintillator is incident; an emitting surface that is configured to emit light; and a reflecting surface that is inclined with respect to the incident surface so that the light from the incident surface is reflected toward the emitting surface. The emitting surface is smaller than the incident surface. A slope surface is provided between the incident surface and the emitting surface, faces the reflecting surface, and is inclined with respect to the incident surface.

The present invention provides a charged particle beam apparatus that covers a wide range of detection angles of charged particles emitted from a sample. Accordingly, the present invention proposes a charged particle beam apparatus that is provided with an objective lens for converging charged particle beams emitted from a charged particle source, and a detector for detecting charged particles emitted from a sample, wherein: the objective lens includes an inner magnetic path and an outer magnetic path which are formed so as to enclose a coil; the inner magnetic path comprises a first inner magnetic path disposed at a position opposite to an optical axis of the charged particle beams and a second inner magnetic path which is formed at a slant with respect to the optical axis of the charged particle beams and which includes a leading end of the magnetic path; and a detection surface of the detector is disposed at the outer side from a virtual straight line that passes through the leading end of the magnetic path and that is parallel to the optical axis of the charged particle beams.

A charged particle beam device is provided which minimizes the beam irradiation amount while maintaining a high measurement success rate. The charged particle beam device includes a control device for controlling a scan deflector on the basis of selection of a predetermined number n of frames, wherein the control device controls the scan deflector so that a charged particle beam is selectively scanned on a portion on a sample corresponding to a pixel satisfying a predetermined condition or a region including the portion on the sample from an image obtained by scanning the charged particle beam for a number m of frames (m&#x2265;1), the number m of frames being smaller than the number n of frames.

Charged particle beam device having inspection scan direction based on scan with smaller dose

The disclosure provides a charged particle detector including a scintillator that emits light with stable intensity and obtains high light emission intensity regardless of an energy of an incident electron. The disclosure provides the charged particle detector including: a first light-emitting part () in which a layer containing GaAlInN (where 0&#x2264;x&#x3c;1, 0&#x2264;y&#x3c;1) and a layer containing GaN are alternately laminated; a second light-emitting part () in which the layer containing GaAlInN (where 0&#x2264;x&#x3c;1, 0&#x2264;y&#x3c;1) and the layer containing GaN are alternately laminated; and a non-light-emitting part () that is interposed between the first light-emitting part () and the second light-emitting part () (see FIG.).

Charged particle detector and charged particle beam apparatus

A charged-particle beam system comprises: a charged-particle beam device containing a detection unit for detecting electrons generated by irradiating a sample with a charged-particle beam released from a charged particle source; and a signal detection unit in which a detection signal from the detection unit is input through a wiring. The signal detection unit comprises: a separation unit for separating into a rising signal and a falling signal the detection signal from the detection unit; a falling signal processing unit for at least eliminating ringing in the falling signal; and a combination unit generating and delivering a combined signal produced by combining the rising signal, which has been separated by the separation unit, with the falling signal wherefrom the ringing has been eliminated by the falling signal processing unit.

Charged-particle beam system

An object of the invention is to provide a charged particle beam apparatus capable of achieving both acquisition of an image having high resolution of an inspection target pattern and suppression of a beam irradiation amount when a specific pattern is an inspection target from a highly integrated pattern group. In order to achieve the object, a charged particle beam apparatus is proposed in which at least one of a stage and a deflector is controlled so as to move a field of view from a reference position to an inspection or measurement target pattern, the number of objects included in a first image obtained by scanning a position of the field of view in a moving process of the field of view with a charged particle beam of a first irradiation condition is counted, and in a case where the number of the objects satisfies a predetermined condition, a second image is generated based on scanning with a charged particle beam of a second irradiation condition of a higher dose than that of the first irradiation condition.

A charged particle beam device includes a scintillator and

Light guide, detector having light guide, and charged particle beam device

The present invention provides a light guide capable of guiding light generated by a scintillator at high efficiency to a photoreceiving element, a detector, and a charged particle beam device. For attaining the purpose, the present invention proposes a light guide that guides light generated by a scintillator to a photoreceiving element, provided with a scintillator containment portion formed of a first surface facing a surface opposite to a charged particle incident surface of the scintillator and a second surface facing a surface different from the surface opposite to the charged particle incident surface of the scintillator, and a tilted surface reflecting light incident from the second surface to the inside of the light guide.

The objective of the present invention is to provide a charged particle beam device wherein scanning is performed through a scanning pattern that may suppress the influence from charge accumulation without having to perform blanking. In order to achieve this objective, a charged particle beam device is proposed wherein a first scan line is scanned by deflecting a charged particle beam in a first direction. The charged particle beam is deflected in a manner where the ending point of the first scan line is connected to the scan starting point of a second scan line which is arranged to be parallel to the first scan line so as to draw a scanning trajectory, thereby modifying the scan line position. The second scan line is scanned by scanning the charged particle beam from the scan starting point of the second scan line toward a second direction that is opposite to the first direction. After scanning the second scan line, the charged particle beam device scans the interior of a first frame by repeating the scan line position modification and the scanning of the charged particle beam toward the opposite direction. After scanning the first frame, the charged particle beam device starts the scanning of a second frame with the scan ending point contained within the first frame serving as the scan starting point.

The present invention has an object to provide a scanning electron microscope which suppresses a potential gradient produced by preliminary charge without changing lens conditions of an electron microscope. As an aspect to achieve the above object, there is proposed a scanning electron microscope in which a scanning deflector is controlled so that a second beam is scanned to detect electrons released from a sample after scanning a first beam on the sample to charge the surface of the sample and the first beam is scanned so that charge density in a surrounding part within a scanned area by the first beam is increased relatively as compared with a center part within the scanned area by the first beam.

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Tokyo, Japan

Shahedul Hoque