The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 20, 2021

Filed:

Aug. 31, 2018
Applicant:

Hitachi High-tech Corporation, Tokyo, JP;

Inventors:

Hideki Itai, Tokyo, JP;

Kumiko Shimizu, Tokyo, JP;

Wataru Mori, Tokyo, JP;

Hajime Kawano, Tokyo, JP;

Shahedul Hoque, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/147 (2006.01); H01J 37/28 (2006.01); H01J 37/22 (2006.01);
U.S. Cl.
CPC ...
H01J 37/28 (2013.01); H01J 37/147 (2013.01); H01J 37/1474 (2013.01); H01J 37/22 (2013.01); H01J 2237/221 (2013.01); H01J 2237/2806 (2013.01); H01J 2237/2817 (2013.01);
Abstract

A charged particle beam device is provided which minimizes the beam irradiation amount while maintaining a high measurement success rate. The charged particle beam device includes a control device for controlling a scan deflector on the basis of selection of a predetermined number n of frames, wherein the control device controls the scan deflector so that a charged particle beam is selectively scanned on a portion on a sample corresponding to a pixel satisfying a predetermined condition or a region including the portion on the sample from an image obtained by scanning the charged particle beam for a number m of frames (m≥1), the number m of frames being smaller than the number n of frames.


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