The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 24, 2023

Filed:

Dec. 28, 2021
Applicant:

Hitachi High-tech Corporation, Tokyo, JP;

Inventors:

Toshiyuki Yokosuka, Tokyo, JP;

Chahn Lee, Tokyo, JP;

Hideyuki Kazumi, Tokyo, JP;

Hajime Kawano, Tokyo, JP;

Shahedul Hoque, Tokyo, JP;

Kumiko Shimizu, Tokyo, JP;

Hiroyuki Takahashi, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/28 (2006.01); H01J 37/147 (2006.01); H01J 37/20 (2006.01); H01J 37/22 (2006.01);
U.S. Cl.
CPC ...
H01J 37/28 (2013.01); H01J 37/147 (2013.01); H01J 37/20 (2013.01); H01J 37/22 (2013.01); H01J 2237/2803 (2013.01); H01J 2237/2806 (2013.01); H01J 2237/2817 (2013.01); H01J 2237/2826 (2013.01); H01J 2237/3045 (2013.01);
Abstract

The scanning charged particle beam microscope according to the present application is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation points than when the charged particle beam irradiates a position on the sample corresponding to each of the irradiation points (a position on the sample corresponding to each pixel detecting a signal). This allows the effects from a micro-domain electrification occurring within the FOV to be mitigated or controlled.


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