Anseong-si, South Korea

Seok Min Hong


Average Co-Inventor Count = 7.2

ph-index = 2

Forward Citations = 6(Granted Patents)


Location History:

  • Gyeonggi-Do, KR (2008)
  • Anseong-Si, KR (2013)

Company Filing History:


Years Active: 2008-2013

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3 patents (USPTO):

Title: The Innovative Journey of Seok Min Hong: A Prominent Figure in the World of Inventors

Introduction:

Seok Min Hong, a dedicated inventor based in Anseong-si, South Korea, has carved a niche for himself in the field of innovation with his relentless pursuit of excellence and passion for creating impactful solutions. His innovative spirit continues to inspire others in the industry.

Latest Patents:

Seok Min Hong's latest patents include a polishing slurry, a method of producing the same, and a method of polishing substrates. These inventions are geared towards enhancing the chemical mechanical polishing process for flattening semiconductor laminates. The patented methods provide high removal selectivity to nitride layers, reduce scratches on flattened surfaces, and facilitate the fabrication of ultra-highly integrated semiconductors with fine design rules.

Career Highlights:

Throughout his career, Seok Min Hong has made significant contributions to companies like K. C. Tech Co., Ltd., and Iucf-hyu. His innovative approach to problem-solving and dedication to pushing the boundaries of technology have led to the development of groundbreaking solutions in the semiconductor industry.

Collaborations:

Seok Min Hong has collaborated with esteemed coworkers such as Jae Hyun Jeon and Yong Kim. Together, they have worked on various projects aimed at revolutionizing the semiconductor manufacturing process and driving innovation in the field.

Conclusion:

Seok Min Hong's unwavering dedication to innovation, coupled with his remarkable achievements in the field of inventing, solidifies his position as a prominent figure in the world of inventors. His pioneering work continues to have a lasting impact on the industry, inspiring others to strive for excellence and push the boundaries of technological advancement.

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